Qua is proud to be exhibiting at the Ultrapure Water Microelectronics show in Portland, Oregon on May 31st and June 1st.  We will highlighting our FEDI (Fractional Electrodeionization) Technology as a solution for the microelectronics industry.  Here’s a brief summary of our FEDI :

FEDI Technology

Making a good technology even better

There are two types of ionic impurities removed in an EDI process; strongly ionized impurities (divalent ions such as Ca, Mg, SO₄ and monovalent ions such as Na, Cl and HCO₃) and weakly ionized impurities (such as CO₂ B and SiO₂). Both types of ionic impurities require a different driving force (current) for movement and separation. Strongly ionized impurities require less current, whereas weakly ionized impurities require more. Rather than applying one current to the entire module, the FEDI process differentiates the treatment of weakly ionized and strongly ionized impurities by applying different currents and voltages in a two stage process. This allows a significant portion of strongly ionized impurities, mainly the divalent ions, which can cause precipitation at a higher voltage, to be removed in Stage-1. Subsequently, a higher voltage is applied for removing weakly ionized impurities in Stage-2. The rejected ions from both stages are removed, using separate reject streams, thus preventing hardness precipitation.

And more about UPW Micro :