Qua is proud to be exhibiting at the Ultrapure Water Microelectronics show in Portland, Oregon on May 31st and June 1st.  We will highlighting our FEDI (Fractional Electrodeionization) Technology as a solution for the microelectronics industry.  Here’s a brief summary of our FEDI :

FEDI Technology

Making a good technology even better

There are two types of ionic impurities removed in an EDI process; strongly ionized impurities (divalent ions such as Ca, Mg, SO4 and monovalent ions such as Na, Cl and HCO3) and weakly ionized impurities (such as CO2 B and SiO2). Both types of ionic impurities require a different driving force (current) for movement and separation. Strongly ionized impurities require less current, whereas weakly ionized impurities require more. Rather than applying one current to the entire module, the FEDI process differentiates the treatment of weakly ionized and strongly ionized impurities by applying different currents and voltages in a two stage process. This allows a significant portion of strongly ionized impurities, mainly the divalent ions, which can cause precipitation at a higher voltage, to be removed in Stage-1. Subsequently, a higher voltage is applied for removing weakly ionized impurities in Stage-2. The rejected ions from both stages are removed, using separate reject streams, thus preventing hardness precipitation.

And more about UPW Micro :

The Ultra pure Water Micro Conference

 UPW Micro covers the following topics and more

Particles management/control

Particles monitoring

UPW needs for wafer processing tools

UPW user perspective
UPW quality and UPW systems outside of semiconductor fab
Small UPW/DI systems

H2O2 monitoring/control/Impact on monitoring process

UPW materials improvements

Point of use treatment

TOC / organics; TOC speciation

Metallics in UPW process

Cost reduction and other continuous improvement


Dilute sulfuric treatment, TDS reduction

Reclamation and reuse challenges

Effect of water quality to cooling towers and role of cooling towers in water management and conservation

New chemistry challenges

Organic control

Sulfuric acid and salinity in the wastewater

Wastewater monitoring issues

Cu waste management

Come Visit us at Booth #32